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Chemical compound From Wikipedia, the free encyclopedia
Tribromosilane is the chemical compound with the formula HBr3Si.[1] At high temperatures, it decomposes to produce silicon, and is an alternative to purified trichlorosilane of ultrapure silicon in the semiconductor industry.
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Names | |||
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IUPAC name
Tribromosilane | |||
Other names
Silicobromoform; Tribromomonosilane | |||
Identifiers | |||
3D model (JSmol) |
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ChemSpider | |||
ECHA InfoCard | 100.029.250 | ||
PubChem CID |
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UNII | |||
CompTox Dashboard (EPA) |
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Properties | |||
Br3HSi | |||
Molar mass | 268.805 g·mol−1 | ||
Except where otherwise noted, data are given for materials in their standard state (at 25 °C [77 °F], 100 kPa).
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The Schumacher Process of silicon deposition uses tribromosilane gas to produce polysilicon, but it has a number of cost and safety advantages over the Siemens Process to make polysilicon.[2]
It may be prepared by heating crystalline silicon with gaseous hydrogen bromide at high temperature.[3] It spontaneously combusts when exposed to air.[4]
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