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Rzhanov Institute of Semiconductor Physics
Research institute in Novosibirsk, Russia From Wikipedia, the free encyclopedia
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Rzhanov Institute of Semiconductor Physics of the Siberian Branch of the RAS (Russian: Институт физики полупроводников имени А. В. Ржанова СО РАН) is a research institute in Akademgorodok of Novosibirsk, Russia. It was founded in 1964.
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History
The institute was created in 1964 by merging the Institute of Solid State Physics and Semiconductor Electronics and the Institute of Radiophysics and Electronics.[1] In the 1970s, the institute began to work on developing molecular-beam epitaxy methods.[1]
Scientific activity
Development of the physical fundamentals of microelectronics, acousto-electronics, microphotoelectronics, quantum electronics; the study of physical phenomena in semiconductor thin-film structures etc.[2]
References
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