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Trisilane
Chemical compound From Wikipedia, the free encyclopedia
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Trisilane is the silane with the formula H2Si(SiH3)2. A liquid at standard temperature and pressure, it is a silicon analogue of propane. In contrast with propane, however, trisilane ignites spontaneously in air.[2]
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Synthesis
Trisilane was characterized by Alfred Stock having prepared it by the reaction of hydrochloric acid and magnesium silicide.[3][4] This reaction had been explored as early as 1857 by Friedrich Woehler and Heinrich Buff, and further investigated by Henri Moissan and Samuel Smiles in 1902.[2]
Decomposition
The key property of trisilane is its thermal lability. It degrades to silicon films and SiH4 according to this idealized equation:
- Si3H8 → Si + 2 SiH4
In terms of mechanism, this decomposition proceeds by a 1,2 hydrogen shift that produces disilanes, normal and isotetrasilanes, and normal and isopentasilanes.[5]
Because it readily decomposes to leave films of Si, trisilane has been explored a means to apply thin layers of silicon for semiconductors and similar applications.[6] Similarly, thermolysis of trisilane gives silicon nanowires.[7]
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References
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